Canon FPA-6000 Platform models:

• PA-6000ES5 KrF Scanner

• FPA-6000AS4 ArF Scanner
  

The FPA-6000 is a space-efficient, inherently stable, tightly integrated and highly flexible single-stage scanning platform that supports mass production on 300- and 200-millimeter substrates down to the 45-nanometer node.

With the fastest synchronized wafer stage scanning (500 mm/second), stepping (1000 mm/sec) and reticle scanning speed (2000 mm/sec) in the industry, the 6000 Platform enables patterning 300-mm wafers at the rate of 140wph—and 170wph for 200mm.

Even at these remarkable speeds, the Canon FPA-6000 platform achieves overlay accuracy sufficient for 65nm. In the FPA-6000 series scanning platform, the imaging optics and the body are an inseparable system. The reticle and wafer stages are counter-balanced to eliminate scanning forces before they produce vibrations.

Enlightened Lithography™—A case in point!

"Bells and whistles" can boost cost without a sufficient payback in performance. Instead, Canon aims to give chipmakers more usable performance per unit of technology and per unit of cost. In other words, to do the job intelligently, efficiently…elegantly. Canon calls this approach Enlightened Lithography™--- and its new FPA-6000 Scanning Platform is a good example. A streamlined single-stage design combines 500mm/second scanning speed and ultra high-precision mechanics with extremely accurate and flexible projection capabilities. The result is unprecedented performance with maximum efficiency of both space and cost.