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ArF SCANNERS

 

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Canon ArF scanners have evolved through four generations of development in all areas of system technology, with emphasis on platform design fundamentals, imaging/machine performance, and cost of ownership.

To serve the 100nm node generation, Canon has already introduced the FPA-5000AS3, an ArF exposure tool equipped with an NA0.75 lens. Having also anticipated the trend now underway in ArF volume production using very aggressive RET methods, Canon has developed the FPA-6000AS4, with an ultra-high NA0.85 lens, on new platform that provides high productivity to handle critical dimension shrinkage beyond the 90nm node.

 


FPA-6000AS4 Scanner

The industry's fastest ArF scanner also has the highest NA (0.85), and an ultra-low aberration lens system. Used in tandem with a dual-chamber 193nm light source, the FPA-6000AS4 can project features as small as 85nm.

 

 
 
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