Canon KrF lithography tools remain the core tools used in IC production as a result of their enhanced lens capabilities and corresponding mechanical advancements, supporting sub-wavelength techniques.

FPA-3000EX6 Stepper

The FPA-3000EX6 has a high definition, high brightness (0.65NA) lens for printing circuit patterns with 0.15µm features at 5:1 reduction (22mm x 22mm field). Plus, it contains many other features for high-throughput production of 256-mbit DRAM on 8-in. wafers.

FPA-5000ES4 Scanner

The FPA-5000ES4 belongs where 0.12-µm design rules and 110+wph rates (300mm) need to be routine. Its 0.80-NA, ultra-low aberration lens is the most advanced product of Canon’s wavefront engineering process, with overlay accuracy to match.

FPA-6000ES5 Scanner

The FPA-6000ES5 resolves 0.11µm design rule IC features and allows a wide range of illumination modes for sub-wavelength extension. With 0.80-NA and an ultra-low aberration lens system, the scanner is built on Canon’s new 140-wph, F2-capable FPA-6000 single-stage platform.