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Simpler,Smarter Imaging Options
Articles
"Canon 157nm update: Bring on the scanners"
- At the coming 4th International Symposium on
157nm Lithography, all eyes will be on the first 157nm scanners.
This article is the Canon "Report Card" on its
program to complete a full-field first-generation F2 scanner
system by the fourth quarter of 2003; followed by a full
production tool, the FPA-6000FS2, in early 2005.
"NGL: Outlook and insights" - mainly
about Canon's EUV lithography (EUVL) program—reviews
its applicable pioneering work with soft X-ray, its progress
in building the infrastructure for building EUVL tools (including
a new reflectometer), and its at-wavelength metrology.work
with EUVA, a Japanese research consortium. But the article
also reports on Canon's other NGL initiative, the Maskless
ML2 lithography program.
"Which aberration is Z1,000,000(r, )?"
- Dr. Optics draws up a new appreciation of Zernike Polynomials,
including a discussion of how to analyze wavefront maps.
"A Mission Statement That Maps Reality"
-The U.S. Semiconductor Equipment Divison's new mission
statement is the "marching orders" for its strong
role in Canon's move to lithography leadership. Namely,
to become the foremost partner of lithography customers
who operate in or from within the U.S. market.
"Lithography and the Back End of the Line"
- Chris A. Mack gives the matter of wiring together the
transistors after gate patterning, known as BEOL processing,
the attention it deserves as a critical contributor to circuit
performance. SPECIAL NOTE: Chris Mack has contributed to
all 20 issues of SubMicron Focus.
"Canon at SPIE Microlithography 2002"
- In addition to announcing a new exhibition booth and special
events and sponsorships, this section provides a synopsis
of all Canon papers presented.
"Extending ArF to the 65-nm node" -
In this guest article, Frank Driessen, Numerical Technologies,
Inc., presents a shifting technique called Full Phase that
indicates the industry can reliably extend 193-nm lithography
to the 65-nm process node using today’s lenses.
"Mechatronics: Finessing the roadmap."
- (The story behind the Canon FPA-6000 platform
design.) Dr. Shigeyuki Uzawa, who led the the FPA-6000 platform
development project, describes how the close integration
of intelligent ultra-precision dynamic systems and subsystems
across enables Canon’s latest platform to achieve
performance to the 45nm node.
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