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i-Line (365nm wavelength)
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The FPA-5500iX is a 300mm-capable stepper with the same wide field size of the FPA-3000iW and the high throughput of the FPA-5500iZ. It is recommended for CCD/LCD use as well as for rough layer IC device production in combination with higher NA Canon i-line tools and excimer scanners and steppers.
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Wide exposure field, high throughput for maximum production. With its newly designed 2:1 lens, the FPA-5500iX can expose a 50mm x 50mm area in a single shot. Its high-speed wafer stage design, extremely fast step and settle times, and illumination system with 4.5kW super high-pressured mercury lamp enables a throughput of 137wph on 300mm wafers and 160wph on 200mm wafers.
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300mm wafer and CCD/LCD capable. Designed for integration with the FPA-5000ES4 and FPA-5000AS3 for optimal processing at either 300 or 200mm wafer size. The FPA-5000iX exposure size and high productivity supports the production of CCDs and LCDs.
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Reticle SMIF and automation ready. 300mm fab automation features and options include reticle SMiF and FOUP, and in-line loading on the front, left, or right side.
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Semiconductor Specifications
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| | Model type: | i-Line (365nm) Stepper |
| | Wafer size: | 300mm; 200mm |
| | Resolution: | ≤0.50µm |
| | Numerical Aperture (NA): | 0.28 ~ 0.37 |
| | Reticle size: | 6in. (0.25in. thick) |
| | Reduction ratio: | 2:1 |
| | Field size: | 50mm x 50mm |
| | Overlay accuracy: | ≤ 60nm (M+3 ) |
| | Throughput: | ≥137wph (300mm); ≥160wph ( 200mm) |
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