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ArF (193nm wavelength)
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The new FPA-7000AS7 is an ArF immersion scanning stepper with the highest NA, capable of sub-45nm resolution in a high-volume production environment
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Ultra-low aberration Catadioptric ArF lens features the world's highest NA (1.35)
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AS7 immersion system utilizes a unique, continuous-flow liquid film flow nozzle that provides the temperature and defect control and productivity required for immersion lithography.
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The Two-Wafer Stage System features 2 fully independent wafer stage units that allow precise stage control and high speed "free swapping" of the stage units to provide the highest productivity and stage accuracy in the industry
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To meet the demands of extreme low-k1 lithography, the Canon In-House Solution Tool utilizes in-situ information to provide optimum exposure conditions
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Semiconductor Specifications
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| | Model type: | ArF (193nm) Scanner |
| | Wafer size: | 300mm |
| | Resolution: | ≤45nm |
| | Numerical Aperture (NA): | 0.85 ~ 1.35 |
| | Reticle size: | 6in. |
| | Reduction ratio: | 4:1 |
| | Field size: | 26mm x 33mm |
| | Overlay accuracy: | ≤6nm |
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