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SubMicron Focus Newsletter
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Thank you for your interest in SubMicron Focus, Canon's newsletter informing our customers and partners of the latest lithography developments. In addition to technical articles contributed by industry, SubMicron Focus also features news about Canon, developments in microlithography, and product and event information.
If you would like copies of SubMicron Focus, have suggestions for future issues or would like to contribute a relevant article contact us at semimarketing@cusa.canon.com. |
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| CURRENT ISSUE |
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| Extreme KrF !
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| Extending to 100...90...80nm |
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| Articles |
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| "KrF/X - It's About the Bottom Line!"
- This article addresses the key advantages and issues of KrF extension (KrF/X) for DRAM, Flash, Logic, and other device manufacturers who may want to stay with their 248nm infrastructure either to expose critical layers (instead of using ArF), or to relieve their mid-layer burden (when using ArF). While admitting that KrF/X is a CoO decision based on both technical difficulty and technical maturity, Canon presents it as a strategy that merits full investigation and explains why its successful implementation requires an ultra-high NA exposure tool. |
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| "Extending KrF Beyond Normal Limits" - This article by Cymer Product Marketing Manager Charles Sheets, outlines the evolution of KrF light sources - particularly Cymer's ELS-7010 - to support increasing throughput requirements, highly line-narrowed bandwidth performance to pattern shrinking CDs, and dramatically improved module lifetimes that result in significantly reduced consumable costs. |
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| "Showcase: FPA-6000ES6 and FPA-5500iZ+" - This issue showcases two new Canon exposure tools to help IC manufacturers extend their KrF and/or i-line investment - in capital, experience and skill - by one or two more technology nodes. Headlined: "Go to CD extremes without leaving your CoO comfort zone," this section presents the unique capabilities of both tools. |
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| "The Fundamentals of IDEALSmile" - This article traces the evolution of IDEAL to IDEALSmile and explains the unique value of this new single-exposure RET for printing contact holes. A sidebar article captures the main elements of a more detailed technical report, "Imaging 90nm FLASH memory contact holes with ArF/IDEALSmile," written by multi-company team including STMicroelectronics, Mentor Graphics, and Canon's Kenji Saito. |
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| "The Basic Issues of Immersion Lithography: Part 1" - As promised in a preceding issue of SubMicron Focus, "Dr. Optics" - Dr. Akiyoshi Suzuki of Canon - begins a discussion of the several optics challenges that immersion lithography presents at any wavelength - including KrF (248nm). With figures and formulas he covers the principles of the refractive index and gives thorough explanation of the thoroughly manageable "bubble" issue. |
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| "The Vector Nature of Light" - Responding to "much talk about the vector effects of light," Chirs A. Mack, KLA-Tencor, FINLE Division, turns to the reason why very high NAs might produce less than expected image contrast. Why do different polarizations image differently? Why does an electric field have a vector direction, and how does it affect lithographic image quality? What might come from polarized illumination that take advantage of the "good" polarization? While his discussion gets to the bottom of it, clearly the vector nature of light and polarization control of the illumination will be unavoidable topics for scanners and light source makers in the hyper-NA era. |
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| "Foundations for Success - Focusing on Growth" - In April 2004, Junji Ichikawa became the Group Executive of Canon Optical Products Operations. Here he talks about Canon's strong commitment and growing investment in IC lithography and micropatterning leadership. In addition to lithography technology development, he also stresses production values - quality and delivery time - as essential to helping Canon customers achieve higher uptime and greater productivity.
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Summer 2004 |
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Volume 9, Issue 2 |
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