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Canon participates in numerous technical conference worldwide. Below are highlighted abstracts for technical papers written for these conferences.
To receive the full copy of these technical papers, send your request by email to semimarketing@cusa.canon.com.
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| Contact Printing to the 45nm Node Using a Binary Mask and 248nm Lithography - 2003 |
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| Evaluation of Various Pitches 100nm Contact Holes Applying IDEALSmile with High NA KrF Scanner - 2003 |
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| Generating Sub-30nm Poly-Silicon Gates Using PECVD Amorphous Carbon as Hardmask and Anti-Reflective Coating - 2003 |
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Download Abstract |
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| The Vortex Via Process: Analysis and Mask Fabrication for Contact CDs <80nm - 2003 |
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Download Abstract |
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| TIS- WIS Interaction Characterization on Overlay Measurement Tool - 2002 |
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Download Abstract
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| Method of Zernike Coefficient Extraction for Optics Aberration Measurement - 2002 |
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Download Abstract
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You may download any PDF file above for your personal use. All rights reserved by Canon.
Note: To view the above PDF files, you will need the free Adobe Acrobat Reader. Go to the Adobe web site to download the free Reader. |
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| Copyright 2003 Society of Photo-Optical Instrumentation Engineers. These papers were published in the 2003, 2002 and 2001 SPIE Microlithography Proceedings and are made available as an electronic reprint with permission of SPIE. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited. |
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