Canon Appeals to Internet-of-Things and Artificial Intelligence Manufacturing Markets with FPA 5550iZ2 i Line stepper
New FPA-5550iZ2 i-line semiconductor lithography system achieves optimal high productivity, high overlay accuracy
MELVILLE, N.Y., December 22, 2016 – Canon U.SA., Inc., a leader in digital imaging solutions, has announced that its parent company, Canon Inc., has commenced sales of the FPA‑5550iZ2, a successor to the FPA‑5550iZ i‑line semiconductor lithography system or “stepper”1 that is known for its stable operation and productivity. The FPA‑5550iZ2 is suitable for manufacturing logic, memory and CMOS image sensor devices and is designed to achieve even greater productivity and overlay accuracy when compared to its predecessor.
Two paths to continued growth in the semiconductor industry have been circuit scaling or miniaturization and increasing wafer diameters to realize reduced chip-production costs and improved device performance. However, as the rate of scaling slows, demand has increased for semiconductor lithography systems that realize even greater productivity than those currently available. Scaling challenges have also driven pursuit of high levels of system integration and the development of devices that employ alternative structures, such as 3D NAND flash memory, that demand semiconductor lithography systems that support a variety of processes. The FPA‑5550iZ2 inherits the stable operation of its predecessor and through its capacity for modification, allows for continuous upgrades to its enhanced platform that support the development of a variety of different solutions to meet diverse user needs.
Achieving High Levels of Productivity and Overlay Accuracy
The FPA‑5550iZ2 realizes a high level of productivity (wafer-processing ability) by reducing wafer-processing time through sequence optimization and reducing wafer lot overhead time. Equipped with the proprietary Canon SSC (Shot Shape Compensator) projection optical system, the FPA‑5550iZ2 can correct for intrafield XY magnification differences and skew.2 The enhanced intrafield correction capability of the FPA‑5550iZ2 provides a high level of overlay accuracy when matching to existing fields on wafer.
Supporting Various Solutions for Logic, Memory and Image Sensor Devices
With the advent of the age of the internet-of-things, artificial intelligence and big data, there is an increasing demand for large-capacity storage devices. Additionally, the development of technologies, such as driverless cars and driver assistance systems has resulted in an increase in demand for high-sensitivity image and position sensors. Depending on the process required, the FPA‑5550iZ2 can be equipped with optional solutions that meet a variety of process needs. In addition to realizing high-productivity and overlay accuracy necessary to manufacture next-generation devices, the FPA‑5550iZ2 includes solutions for color-filter processes that were developed for earlier FPA‑5510iZ and FPA‑5510iZs steppers.
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About Canon U.S.A., Inc.
Canon U.S.A., Inc., is a leading provider of consumer, business-to-business, and industrial digital imaging solutions to the United States and to Latin America and the Caribbean (excluding Mexico) markets. With approximately $31 billion in global revenue, its parent company, Canon Inc. (NYSE:CAJ), ranks third overall in U.S. patents granted in 2015† and is one of Fortune Magazine's World's Most Admired Companies in 2016. Canon U.S.A. is committed to the highest level of customer satisfaction and loyalty, providing 100 percent U.S.-based consumer service and support for all of the products it distributes. Canon U.S.A. is dedicated to its Kyosei philosophy of social and environmental responsibility. In 2014, the Canon Americas Headquarters secured LEED® Gold certification, a recognition for the design, construction, operations and maintenance of high-performance green buildings. To keep apprised of the latest news from Canon U.S.A., sign up for the Company's RSS news feed by visiting www.usa.canon.com/rss and follow us on Twitter @CanonUSA. For media inquiries, please contact firstname.lastname@example.org.
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†Based on weekly patent counts issued by United States Patent and Trademark Office.
1 A semiconductor lithography system that utilizes a 365 nm wavelength mercury lamp as the light source. 1nm (nanometer) is 1 billionth of a meter.
2 Shots with diagonally oriented distortion