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Deposition

  1. Product

    EC7400 Electronic Component Production PVD Equipment

    Product Highlights

    As low as $0.00
    • Equipped with cassette chamber and transfer..
    • Delivers excellent deposition uniformity
    • Able to accommodate a variety of process mo..
  2. Product

    EL3000 LED Production PVD Equipment

    Product Highlights

    As low as $0.00
    • Batch processing of multiple wafers by tray..
    • Fully automated operation (pumping, wafer t..
    • Provides high target utilization with rotar..
  3. Product

    FC7100 Metal Gate PVD Equipment

    Product Highlights

    As low as $0.00
    • Capable of film composition control through..
    • Precise control of film thickness at sub-na..
    • Excellent uniformity (1σ < 1%).
  4. Product

    HC7100 HDD Sensor PVD Equipment

    Product Highlights

    As low as $0.00

    Features 

    • Offers excellent film thickness distribution of ±1 % or less with the use of LRP (Low Pressure Remote Plasma) sputtering technology
    • Provides very flat and low resistance films with low pressure discharge at 0.02 Pa, which is an order of magnitude lower than conventional sputtering pressure
    • Provides high MR ratio
    • Extensive deposition module lineup 
    • Multi-cathode modules


    Applications 

    • Magnetic read head production 


     

  5. Product

    IC7500 Memory Wire PVD Equipment

    Product Highlights

    As low as $0.00

    Features 

    • Variable cathode magnet position (in 3D) using recipe, enabling easy optimization of film uniformity and target cleaning
    • Provides world's highest standard throughput (80 wafers/hour) 
    • Provides > 90 % uptime in semiconductor memory production line
    • Failure rate < 1 % 


    Applications 

    • Semiconductor memory (for metal wiring material) mass production 


  6. Product

    ML3000 HDD Media PVD Equipment

    Product Highlights

    As low as $0.00

    Features 

    • Provides approximately twice the productivity (up to 1800 disks/hour) compared to competitive equipment
    • Over ten days of continuous operation 
    • Flexible configuration enabling addition of chambers according to process needs
    • Emphasis on vacuum quality to improve magnetic characteristics 
    • Provides high temperature heating and cooling unit for the development of next generation thermally assisted magnetic recording media
    • 30 % space reduction compared to our previous product 


    Applications 

    • Mass production and development of next generation hard disk 


  7. Product

    NC7900 MRAM PVD Equipment

    Product Highlights

    As low as $0.00

    Features 

    • Ultra high vacuum and oblique sputtering technology
    • Excellent interfaces within the MTJ stack
    • Compatible with planar & perpendicular MTJ deposition
    • High throughput (25 wafers/h) with perpendicular MTJ stack process 


    Applications 

    • MRAM and STT-MRAM mass production 


 
If you have a MyCanon Account, your product and CarePAK will be registered using the profile details you provided. For Kit products, you must complete the registration process directly in your account.
If you have a MyCanon Account, your product and CarePAK will be registered using the profile details you provided. For Kit products, you must complete the registration process directly in your account.