Features 

• Offers excellent film thickness distribution of ±1 % or less with the use of LRP (Low Pressure Remote Plasma) sputtering technology
• Provides very flat and low resistance films with low pressure discharge at 0.02 Pa, which is an order of magnitude lower than conventional sputtering pressure
• Provides high MR ratio
• Extensive deposition module lineup 
• Multi-cathode modules

Applications 

• Magnetic read head production 

Features 

• Provides approximately twice the productivity (up to 1800 disks/hour) compared to competitive equipment
• Over ten days of continuous operation 
• Flexible configuration enabling addition of chambers according to process needs
• Emphasis on vacuum quality to improve magnetic characteristics 
• Provides high temperature heating and cooling unit for the development of next generation thermally assisted magnetic recording media
• 30 % space reduction compared to our previous product 

Applications 

• Mass production and development of next generation hard disk