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  1. FC7100 Metal Gate PVD Equipment
    Product Highlights
    As low as $0.00
    • Capable of film composition control through..
    • Precise control of film thickness at sub-na..
    • Excellent uniformity (1σ < 1%).
  2. IC7500 Memory Wire PVD Equipment
    Product Highlights
    As low as $0.00

    Features 

    • Variable cathode magnet position (in 3D) using recipe, enabling easy optimization of film uniformity and target cleaning
    • Provides world's highest standard throughput (80 wafers/hour) 
    • Provides > 90 % uptime in semiconductor memory production line
    • Failure rate < 1 % 


    Applications 

    • Semiconductor memory (for metal wiring material) mass production 


  3. NC7900 MRAM PVD Equipment
    Product Highlights
    As low as $0.00

    Features 

    • Ultra high vacuum and oblique sputtering technology
    • Excellent interfaces within the MTJ stack
    • Compatible with planar & perpendicular MTJ deposition
    • High throughput (25 wafers/h) with perpendicular MTJ stack process 


    Applications 

    • MRAM and STT-MRAM mass production 


 
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Your product and CarePAK will be registered in your MyCanon Portal using the profile details you provided.