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  1. FC7100 Metal Gate PVD Equipment

    Product Highlights

    • Capable of film composition control through ultrahigh vacuum co-sputtering
    • Precise control of film thickness at sub-nanometer level
    • Excellent uniformity (1σ < 1%).
    $0.00
    Out Of Stock
  2. IC7500 Memory Wire PVD Equipment

    Product Highlights

    • Variable cathode magnet position (in 3D) using recipe, enabling easy optimization of film uniformity and target cleaning
    • Provides world's highest standard throughput (80 wafers/hour) 
    • Provides > 90 % uptime in semiconductor memory production line
    $0.00
    Out Of Stock
  3. NC7900 MRAM PVD Equipment

    Product Highlights

    • Ultra high vacuum and oblique sputtering technology
    • Excellent interfaces within the MTJ stack
    • Compatible with planar & perpendicular MTJ deposition
    $0.00
    Out Of Stock