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  1. FPA-1200NZ2C Nanoimprint Stepper

    Product Highlights

    FPA-1200NZ2C nanoimprint steppers can provide ≤ 15 nanometer pattern resolution
    FPA-1200NZ2C systems utilize high-resolution imprint masks that can faithfully reproduce fine circuit patterns on the wafer. Nanoimprint Lithography (NIL) equipment forms patterns on wafers by pressing a mask containing circuit patterns into resist in an imprint process. FPA-1200NZ2C nanoimprint lithography systems support ≤ 15 nanometer processes and can offer benefits over traditional photolithography equipment that can be susceptible to optical distortion.
    As low as $0.00
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If you have a MyCanon Account, your product and CarePAK will be registered using the profile details you provided. For Kits and Refurbished products, you must complete the registration process directly in your account.