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Semiconductor

  1. Product

    FC7100 Metal Gate PVD Equipment

    Product Highlights

    As low as $0.00
    • Capable of film composition control through..
    • Precise control of film thickness at sub-na..
    • Excellent uniformity (1σ < 1%).
  2. Product

    HC7100 HDD Sensor PVD Equipment

    Product Highlights

    As low as $0.00

    Features 

    • Offers excellent film thickness distribution of ±1 % or less with the use of LRP (Low Pressure Remote Plasma) sputtering technology
    • Provides very flat and low resistance films with low pressure discharge at 0.02 Pa, which is an order of magnitude lower than conventional sputtering pressure
    • Provides high MR ratio
    • Extensive deposition module lineup 
    • Multi-cathode modules


    Applications 

    • Magnetic read head production 


     

  3. Product

    HELEN Series Leak Detectors

    Product Highlights

    As low as $0.00
    • Simple operation
    • Industry leading sensitivity, stability, an..
    • Portable
  4. Product

    IC7500 Memory Wire PVD Equipment

    Product Highlights

    As low as $0.00

    Features 

    • Variable cathode magnet position (in 3D) using recipe, enabling easy optimization of film uniformity and target cleaning
    • Provides world's highest standard throughput (80 wafers/hour) 
    • Provides > 90 % uptime in semiconductor memory production line
    • Failure rate < 1 % 


    Applications 

    • Semiconductor memory (for metal wiring material) mass production 


  5. Product

    Quadrupole Mass Spectrometers

    Product Highlights

    As low as $0.00
    • Seamless measurement from process pressure ..
    • Detecting H2 with high sensitivity in depos..
    • Long maintenance cycle and low running cost
  6. Product

    Vacuum Gauges

    Product Highlights

    As low as $0.00
    • High precision, stable pressure measurement
    • Compact (W46 mm × H49 mm × L70 mm) and ligh..
    • Low power consumption (0.5 W)
  7. Product

    ML3000 HDD Media PVD Equipment

    Product Highlights

    As low as $0.00

    Features 

    • Provides approximately twice the productivity (up to 1800 disks/hour) compared to competitive equipment
    • Over ten days of continuous operation 
    • Flexible configuration enabling addition of chambers according to process needs
    • Emphasis on vacuum quality to improve magnetic characteristics 
    • Provides high temperature heating and cooling unit for the development of next generation thermally assisted magnetic recording media
    • 30 % space reduction compared to our previous product 


    Applications 

    • Mass production and development of next generation hard disk 


  8. Product

    NC7900 MRAM PVD Equipment

    Product Highlights

    As low as $0.00

    Features 

    • Ultra high vacuum and oblique sputtering technology
    • Excellent interfaces within the MTJ stack
    • Compatible with planar & perpendicular MTJ deposition
    • High throughput (25 wafers/h) with perpendicular MTJ stack process 


    Applications 

    • MRAM and STT-MRAM mass production 


  9. Product

    NC8000 MRAM Etching Equipment

    Product Highlights

    As low as $0.00

    Features 

    • Large diameter IBE grid provides very good uniformity and high productivity 
    • Clampless holder with 2 axes of rotation and tilt
    • Optical end point detection system (OES) for etch depth control 


    Applications 

    • MRAM mass production 


  10. Product

    Vacuum Pumps

    Product Highlights

    As low as $0.00
    Canon ANELVA provides a variety of pumps, including world's highest energy efficient cryopumps, for low vacuum to ultra-high vacuum applications.
  11. Product

    FPA-1200NZ2C Nanoimprint Stepper

    Product Highlights

    As low as $0.00
    FPA-1200NZ2C nanoimprint steppers can provide ≤ 15 nanometer pattern resolution
    FPA-1200NZ2C systems utilize high-resolution imprint masks that can faithfully reproduce fine circuit patterns on the wafer. Nanoimprint Lithography (NIL) equipment forms patterns on wafers by pressing a mask containing circuit patterns into resist in an imprint process. FPA-1200NZ2C nanoimprint lithography systems support ≤ 15 nanometer processes and can offer benefits over traditional photolithography equipment that can be susceptible to optical distortion.
  12. Product

    MS-001 Wafer Metrology System

    Product Highlights

    As low as $0.00
    MS-001 is a high-precision wafer alignment measurement device for semiconductor lithography systems
    Canon’s MS-001 wafer metrology system is capable of measuring the position of hundreds of alignment marks on semiconductor wafers in advance of wafer patterning. Premeasuring the alignment mark positions can result in improved overlay accuracy and reduced alignment measurement time in the lithography process.
    The MS-001 allows the majority of alignment measurements to be performed in one batch process, outside of the lithography system. The productivity of the lithography system can be improved by reducing the number of measurements performed.
 
If you have a MyCanon Account, your product and CarePAK will be registered using the profile details you provided. For Kit products, you must complete the registration process directly in your account.
If you have a MyCanon Account, your product and CarePAK will be registered using the profile details you provided. For Kit products, you must complete the registration process directly in your account.