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  1. FPA-1200NZ2C Nanoimprint Stepper

    Product Highlights

    FPA-1200NZ2C nanoimprint steppers can provide ≤ 15 nanometer pattern resolution
    FPA-1200NZ2C systems utilize high-resolution imprint masks that can faithfully reproduce fine circuit patterns on the wafer. Nanoimprint Lithography (NIL) equipment forms patterns on wafers by pressing a mask containing circuit patterns into resist in an imprint process. FPA-1200NZ2C nanoimprint lithography systems support ≤ 15 nanometer processes and can offer benefits over traditional photolithography equipment that can be susceptible to optical distortion.
    As low as $0.00
  2. FPA-5550iX Stepper

    Product Highlights

    FPA-5550iX steppers provide large-field device imaging without stitching adjacent fields
    FPA-5550iX steppers adopt a high-NA, 1/2 reduction projection lens to deliver 0.5 um resolution across a large 50 mm x 50 mm exposure field. The FPA-5550iX is suitable for production of full-field image sensors and advanced augmented reality displays that are larger field than Front-End-Of-the-Line (FEOL) lithography exposure fields (26mm x 33mm) and FPA-5550iX steppers can help avoid pattern stitching of adjacent fields that can directly affect yield.
    As low as $0.00
If you have a MyCanon Account, your product and CarePAK will be registered using the profile details you provided. For Kit products, you must complete the registration process directly in your account.
If you have a MyCanon Account, your product and CarePAK will be registered using the profile details you provided. For Kit products, you must complete the registration process directly in your account.