FPA-1200NZ2C Nanoimprint Stepper
FPA-1200NZ2C systems utilize high-resolution imprint masks that can faithfully reproduce fine circuit patterns on the wafer. Nanoimprint Lithography (NIL) equipment forms patterns on wafers by pressing a mask containing circuit patterns into resist in an imprint process. FPA-1200NZ2C nanoimprint lithography systems support ≤ 15 nanometer processes and can offer benefits over traditional photolithography equipment that can be susceptible to optical distortion.
Terms
The following are the terms and conditions ("Terms") for the Canon U.S.A., Inc. Auto Replenishment System (the "Service"). These Terms are between you and Canon U.S.A., Inc. ("Canon USA," "we" or "us") and govern your and our respective rights and obligations relating to the Service. Please note that your use of the Service is also governed by Canon Direct’s Terms of Use and our Privacy Statement, each of which (as changed over time) are incorporated into these Terms, and all of which govern our respective rights and obligations concerning the Service. By placing an order through, or otherwise using, the Service, you accept, and agree to be bound by, these terms, conditions, limitations and requirements. Please read these Terms carefully.
Service
We reserve the right to change the Service benefits, including discount amounts and eligibility used to determine discount amounts, at any time in our sole discretion. All such changes will apply to future orders.
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Eligible Products
The eligible products that may be ordered through the Service (the identity of which are subject to change) are set forth on the product detail page on the Canon Direct website (shop.usa.canon.com) with the option to select the Service displayed (each, an "Eligible Product"). Your participation in the Service is personal to you, and you may not assign or transfer your enrollment, or any of the benefits of the Service, to any third party without our authorization. The Service is only available to customers with shipping addresses in the 50 United States and the District of Columbia.
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Enrollment
As part of your enrollment in the Service, you will be required to register with us so that your printer can be identified as participating in the Service. Instructions for registering your printer are contained in the introductory email sent to you after you apply for enrollment in the Service, as well as in the "My Account" section of the Canon Direct website (shop.usa.canon.com). You will be required to accept terms and conditions provided by our parent company, Canon Inc., as part of registering your printer. Canon Inc. will notify us when an ink or toner cartridge reaches a certain low ink/toner threshold, and we will fill an order for the ink or toner and ship it to you under these Terms. Information provided to us and Canon Inc. may be stored on servers outside of the United States and will be subject to our Privacy Statement. It's possible that your order for Eligible Products will not arrive prior to running out of ink or toner where your use was more than usual, particularly if such greater use occurred over 1 or 2 days.
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Your enrollment in the Service will remain in effect until it is canceled. You can cancel or modify your enrollment at any time via the "My Account" section of the Canon Direct website (shop.usa.canon.com). If you cancel or modify your enrollment after an order has been processed, you will be charged for the order as processed. If the discount for such Eligible Product changes, the new discount will be applied to your future shipments of that Eligible Product. If, after enrollment, you are no longer in possession of your printer for any reason (e.g., due to warranty return, replacement, or exchange), the total cost for the Service will continue to be charged to your payment method until you cancel your enrollment. No refunds will be granted because of your failure to cancel your enrollment in such situation.
Your rights under these Terms will automatically terminate without notice if you fail to comply with any of its terms and conditions. In the event of such termination, we may immediately revoke your access to the Service. Our failure to insist upon or enforce your strict compliance with these Terms and will not constitute a waiver of any of our rights.
Changes to Terms
We may, in our sole discretion, change these Terms without notice to you. If any change to these Terms is found invalid, void, or for any reason unenforceable, that change is severable and does not affect the validity and enforceability of any remaining changes or conditions. YOUR CONTINUED PARTICIPATION AFTER WE CHANGE THESE TERMS CONSTITUTES YOUR ACCEPTANCE OF THE CHANGES. IF YOU DO NOT AGREE TO ANY CHANGES, YOU MUST CANCEL YOUR ENROLLMENT.
Disclaimer of Warranties and Limitation of Liability
WE DISCLAIM ALL WARRANTIES, EXPRESS OR IMPLIED, CONCERNING THE SERVICE INCLUDING THE IMPLIED WARRANTIES OF MERCHANTABILITY, FITNESS FOR A PARTICULAR PURPOSE AND NON-INFRINGEMENT. WITHOUT LIMITING THE PRECEDING SENTENCE, UNLESS OTHERWISE REQUIRED BY APPLICABLE LAW, IN NO EVENT WILL OUR, OR OUR LICENSORS’, AGGREGATE LIABILITY UNDER THESE TERMS WITH RESPECT TO ANY CLAIM EXCEED ONE HUNDRED DOLLARS ($100.00).
Overview
- FPA-1200NZ2C systems utilize high-resolution imprint masks that can faithfully reproduce fine circuit patterns on the wafer
- Nanoimprint Lithography (NIL) equipment forms patterns on wafers by pressing a mask containing circuit patterns into resist in an imprint process
- Nanoimprint lithography can offer benefits over traditional photolithography equipment that can be susceptible to optical distortion
- FPA-1200NZ2C systems support ≤ 10 nanometer processes
- NIL technology enables patterning with a minimum linewidth of 14 nanometer (nanometer = 1 billionth of a meter = nm), equivalent to the 5 nm process node or generation of semiconductor technology
- With further mask technology improvement, NIL is expected to enable circuit patterning with a minimum linewidth of 10 nm, which corresponds to a 2-nm process node
- FPA-1200NZ2C lithography systems offer increased design freedom and process efficiency
- Complex 2-dimensional or 3-dimensional circuit patterns can be formed using a single imprint mask, which may reduce overall process cost of ownership (CoO)
- NIL systems do not require a light source with a special wavelength for fine circuit patterning
- NIL processes can reduce power consumption significantly compared to alternative photolithography equipment currently available for advanced logic semiconductor fabrication (5-nm node with 15 nm linewidth), thereby contributing to CO2 reduction
- FPA-1200NZ2C NIL systems employ technology that reduces defectivity
- Advanced environmental control technology suppresses fine-particle contamination in the equipment
- High-cleanliness environments are required for high-precision alignment supporting multi-layer semiconductor manufacturing
- Fine-particle control can help reduce defects, allowing the formation of fine and complex circuits
- FPA-1200NZ2C systems are compatible with a variety of applications
- NIL technology was originally developed to support high-resolution patterning in leading-edge logic and memory applications
- NIL-compatible applications include fabrication of metalenses that control light with fine structures smaller than the wavelength of visible light, and augmented reality displays with microstructures sized at tens of nanometers