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MS-001 Wafer Metrology System

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MS-001 is a high-precision wafer alignment measurement device for semiconductor lithography systems
Canon’s MS-001 wafer metrology system is capable of measuring the position of hundreds of alignment marks on semiconductor wafers in advance of wafer patterning. Premeasuring the alignment mark positions can result in improved overlay accuracy and reduced alignment measurement time in the lithography process.
The MS-001 allows the majority of alignment measurements to be performed in one batch process, outside of the lithography system. The productivity of the lithography system can be improved by reducing the number of measurements performed.

Technical Specifications

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