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HC7100 HDD Sensor PVD Equipment

As low as $0.00
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  • Offers excellent film thickness distribution of ±1 % or less with the use of LRP (Low Pressure Remote Plasma) sputtering technology
  • Provides very flat and low resistance films with low pressure discharge at 0.02 Pa, which is an order of magnitude lower than conventional sputtering pressure
  • Provides high MR ratio
  • Extensive deposition module lineup 
  • Multi-cathode modules


  • Magnetic read head production 


Technical Specifications

Main Unit Specs