HC7100 HDD Sensor PVD Equipment

$0.00

Features 

  • Offers excellent film thickness distribution of ±1 % or less with the use of LRP (Low Pressure Remote Plasma) sputtering technology
  • Provides very flat and low resistance films with low pressure discharge at 0.02 Pa, which is an order of magnitude lower than conventional sputtering pressure
  • Provides high MR ratio
  • Extensive deposition module lineup 
  • Multi-cathode modules


Applications 

  • Magnetic read head production 


 


Technical Specifications

Main Unit Specs