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NC7900 MRAM PVD Equipment

As low as $0.00
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Features 

  • Ultra high vacuum and oblique sputtering technology
  • Excellent interfaces within the MTJ stack
  • Compatible with planar & perpendicular MTJ deposition
  • High throughput (25 wafers/h) with perpendicular MTJ stack process 


Applications 

  • MRAM and STT-MRAM mass production 


Technical Specifications

Main Unit Specs