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IC7500 Memory Wire PVD

Semiconductor Device Manufacturing

  • Control over cathode magnet position (3D) via process recipe, enables easy optimization of uniformity and cleaning
  • Provides world's highest standard throughput (80 wafers/h)
  • Provides > 90% uptime in semiconductor memory production line
  • Low failure rate (< 1%)

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  • System configuration: Cluster type
  • Substrate: Φ300 mm

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† Prices and specifications subject to change without notice. Actual prices are determined by individual dealers and may vary.

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