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State-Of-The-Art Physical Vapor Deposition (PVD)Technology
Our PVD products are being used for research, development and manufacturing of memory, processors, hard disk drives, magnetic sensors, LEDs, RF filters and many other devices.
PERFORMANCE
Performance Enabled By Engineering Technology
Backed by our expertise in vacuum technology, plasma control and equipment design, these PVD products can sputter a variety of materials to form high quality films. These equipment use advanced engineering concepts to enable precise control of the film thickness in the sub-nanometer range and achieve excellent uniformity.
FEATURES
Semiconductor Device Manufacturing
Canon manufactures reliable PVD equipment for 300mm and 200mm wafer processing. These products find applications in many areas of semiconductor manufacturing, such as MRAM stack deposition, metal gate deposition in gate-first process flow, metal wiring material deposition for semiconductor memory, formation of UBM films for wafer packaging, metal deposition for interconnect process and several others.
Storage Device Manufacturing
Canon is the leading supplier of PVD equipment for magnetic media and read-head manufacturing for hard disk drives. Our products support customers from R&D to mass production. High throughput, up to 1800 disks/hour, of the media deposition equipment keeps the cost of manufacturing low. The state-of-the-art read-head equipment has enabled the rapid evolution of magnetoresistive heads.
Electronic Device Manufacturing
This product line offers PVD equipment for R&D, small-scale production and high-volume manufacturing of electronic components such as LEDs. These come in a stand-alone, cluster-type and/or batch-type configurations, accommodating substrate sizes from Φ2" up to Φ8". A variety of optional features are available to select from, depending on your requirements.
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