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HC7100 HDD Sensor PVD

Storage Device Manufacturing

  • Offers excellent film thickness distribution of ±1% or less with the use of LRP (Low Pressure Remote Plasma Sputtering) technology
  • The magnetron design allows very low pressure discharge (~ 0.02 Pa), resulting in highly smooth and low resistance films
  • The ultra-high vacuum in-situ processing prevents contamination and results in high MR ratio
  • HC7100 is highly customizable with the extensive module lineup to choose from

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  • System configuration: Cluster type
  • Substrate: Φ200 mm, Φ150 mm

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† Prices and specifications subject to change without notice. Actual prices are determined by individual dealers and may vary.

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